| abstract |
(57) [Problem] A radiation-sensitive resin composition which can use various resist solvents, is particularly sensitive, and is useful as a chemically amplified positive resist excellent in resolution, pattern shape, scum, etc. I will provide a. SOLUTION: The radiation-sensitive resin composition comprises (A) a copolymer represented by p-hydroxystyrene / p-ethoxyethoxystyrene / styrene copolymer, and (B) tri (p-methoxyphenyl) sulfone. Phonium trifluoromethanesulfonate, 4-hydroxy-1-naphthyltetrahydrothiophenium trifluoromethanesulfonate, 1,1-bis (phenylfluphonyl) cyclohexane or And a radiation-sensitive acid generator represented by |