http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009079049-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 |
filingDate | 2008-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c26f78710acf84023fb4c2016b1f027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ad08812ff90fc207f4f27c5a0bffd60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 |
publicationDate | 2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009079049-A |
titleOfInvention | Onium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition |
abstract | An onium salt suitable for a radiation-sensitive acid generator, a radiation-sensitive acid generator containing the onium salt as an essential component, and a positive radiation-sensitive resin composition containing the radiation-sensitive acid generator Provided. An onium salt represented by the following formula: (In the formula, Ar 3 is a divalent aromatic hydrocarbon group, R 5 and R 6 are alkyl groups, etc., Ar 3 , w is 1 to 10, y is 0 to 6, v is an integer of 0 to 3. A radiation-sensitive acid generator containing the onium salt as an essential component, and a positive radiation-sensitive resin composition containing the acid generator. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011016746-A |
priorityDate | 2002-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 463.