| abstract |
A chemical amplification type positive resist composition characterized by comprising: a resin which comprises units of at least one member selected between 3-hydroxy-1-adamantyl acrylate and 3,5-dihydroxy-1-adamantyl (meth)acrylate, units of hydroxystyrene, and units having a group unstable to acids and which itself is insoluble or sparingly soluble in alkalis but is alkali-soluble after the group unstable to acids has cleaved by the action of an acid; and an acid generator. The composition is excellent in various performances such as sensitivity, resolution, heat resistance, film retention, applicability, exposure latitude, and resistance to dry etching. In particular, it has been more improved in resolution and exposure latitude. |