| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-26 |
| filingDate |
1998-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a9c4596ed404a4ab04eef308be229b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5ae9034e0a01897025f60633b846840
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d1a0527009e3d4221e730ccf8a30ffa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3a0a538b98c555f45ce7416642b545c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 |
| publicationDate |
1999-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11212261-A |
| titleOfInvention |
Positive photoresist composition and method for producing the same |
| abstract |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition having a high residual film ratio with a high sensitivity and a large depth of focus, a method for producing the same, and an alkali-soluble novolak resin which can be advantageously used in these compositions I will provide a. SOLUTION: (a) a phenolic compound, and (b- 1) 5-30 mol% of unsaturated aliphatic aldehyde and (b- 2) (b) with 70 to 95 mol% of a saturated aliphatic aldehyde (A) An alkali-soluble novolak resin is obtained as a condensation reaction product with the mixed aldehyde. Then, a positive photoresist composition containing this (A) alkali-soluble novolak resin and (B) a quinonediazide group-containing compound is produced. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100531595-B1 |
| priorityDate |
1998-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |