| abstract |
(57) Abstract: It is an object of the present invention to provide a positive photoresist composition in which the obtained resist image is particularly excellent in heat resistance, has a wide defocus latitude, high sensitivity and high resolution. A positive photoresist composition comprising an alkali-soluble resin obtained by condensing a monomer composed of a specific phenol compound and formaldehyde, and a 1,2-quinonediazide compound. |