abstract |
(57) Abstract: A positive photoresist composition capable of forming a resist pattern having excellent development contrast between exposed and unexposed areas and excellent in resolution, exposure margin and depth of focus width characteristics. SOLUTION: (A) an alkali-soluble resin, (B) a quinonediazide group-containing compound, (C) the following general formula (I): (In the formula, R 1 and R 2 are each independently a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, and 1 to 6 carbon atoms. Which is an alkoxy group or a halogen atom) of the above. A positive photoresist composition comprising at least one selected from the polyhydroxy compounds represented by |