| abstract |
(57) 【Abstract】 PROBLEM TO BE SOLVED: A chemical amplification resist which is less affected by standing waves, has excellent focus tolerance, and is excellent in property balance including sensitivity, resolution, pattern shape, process tolerance and the like. A radiation-sensitive resin composition is provided. The composition has (A) a heavy chain having a functional group selected from the group of (A) an acid-decomposable acetal group, an acid-decomposable ketal group, and an acid-decomposable t-butyl group-containing substituent. And a radiation-sensitive acid generator (B) and a compound (C) having a molecular weight of 1,000 or less having a functional group selected from the group consisting of a phenolic hydroxyl group, an alcoholic hydroxyl group and an ethylene oxide chain. |