| abstract |
(57) [Abstract] [Purpose] Sufficient corrosion resistance to the generated plasma, stable generation of plasma sheath, etching, C Provided is a plasma generating electrode device capable of stably performing each treatment such as VD and PVD over the entire surface of a susceptor. [Structure] Base 1 made of dense ceramics, and base 1 An electrode 9 embedded therein, and the electrode 9 and the base 1 The minimum value of the thickness of the electromagnetic wave transmission layer 4 existing between the surface 1a on the plasma generation side is 0.1 mm or more. Preferably, the average value of the thickness of the electromagnetic wave transmission layer 4 is 0.5 mm or more, the average value of the thickness of the electromagnetic wave transmission layer 4 is 5.0 mm or less, and the electrode 9 has a planar shape made of a metal bulk body. The substrate 1, which is an electrode and surrounds the electrode, is an integrally sintered product having no bonding surface. |