abstract |
(57) [Summary] [Structure] A photosensitive composition comprising a substance that generates a basic substance upon exposure to light for pattern formation in a chemically amplified resist pattern formation process and a substance that generates an acid in a post-exposure heating process. And a negative resist composition used in the step of forming a resist pattern in lithography. According to the present invention, it is possible to form a fine resist pattern having a good shape and a high resolution. |