http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013068840-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_749d48f19b19df8fd80958517557e671 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f755c300b2571521cc9151a64d85c60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f1784d8d5536c8f0a015741a46eecbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa |
publicationDate | 2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013068840-A |
titleOfInvention | Resist composition and resist pattern forming method |
abstract | A resist pattern forming method capable of forming a negative pattern, and a resist composition that can be used in the resist pattern forming method and can form a resist film with high film thickness uniformity on a support. A base component whose solubility in an alkaline developer is increased by the action of an acid, a photobase generator component that generates a base upon exposure, and an acid supply component are combined into a specific organic solvent component (S). A step (1) of forming a resist film by applying a dissolved resist composition on a support, a step (2) of exposing the resist film without pre-baking the resist film, and the step A resist pattern comprising a step (3) of baking after (2), and a step (4) of forming the negative resist pattern in which the resist film is alkali-developed and the unexposed portions of the resist film are dissolved and removed A forming method and the resist composition used in the step (1). [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013073061-A |
priorityDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 411.