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filingDate 1994-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_098dd3d253e7b6e156add2a578782e1e
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publicationDate 1995-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07242842-A
titleOfInvention Composition for forming transparent conductive film and transparent conductive film
abstract (57) [Summary] [Structure] Tin-doped indium oxide (ITO) powder; lower alkoxide of Si, Ti, Zr or Al as a binder (Eg, ethyl silicate); Phosphate group as a binding aid, A titanate-based or aluminum-based coupling agent containing a phosphorous acid group or an ester group thereof (for example, bis (Dioctyl pyrophosphate) oxyacetate titanate); and a solvent (eg, alcohol and / or water) for forming a transparent conductive film. [Effect] When this composition is applied to a transparent substrate and dried at less than 200 ° C, the transparency is high and the surface resistance is 1 × 10 5 Ω. A transparent conductive film having an electric conductivity of / □ or less is obtained. Further firing at 200-400 ℃ gives a surface resistance of 1 × 10 4 Ω. / □ or less. Useful for antistatic film, electrode / circuit formation.
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