http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0377317-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 1989-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e20d9fe597aa229f252c1ba8f9c27e30
publicationDate 1991-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0377317-A
titleOfInvention Plasma etching apparatus
abstract PURPOSE: To reduce contamination by a method wherein a material which has been constituted of nonmetal atoms included in a third group to a seventh group of the first period to the third period of the periodic table and of one out of hydrogen, arsenic, antimony, bromine and iodine or of a combination of these is used as a vacuum sealing material. n CONSTITUTION: An anode 4 is used as one part of an external wall of a vacuum container 1; a silicone-based O-ring 10a is arranged at a connection part of the anode with the container; in addition, an O-ring 10b of the same material is arranged for a connection of a cathode 5 with an insulating material 9. A silicone-based rubber may be basically a vacuum sealing material which does not contain any metal from a viewpoint of preventing a contamination. For example, a vacuum sealing material which is constituted of non-metal atoms contained in a third group to a seventh group of the first period to the third period of the periodic table and of one out of hydrogen, arsenic, antimony, bromine and iodine or of a combination of these can be used. n COPYRIGHT: (C)1991,JPO&Japio
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006066744-A
priorityDate 1989-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.