http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006066744-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6638ac6b1020cd2c62d09d748bc1ab9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0775eca316e5904543e8bbab00186608 |
| publicationDate | 2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006066744-A |
| titleOfInvention | Solid source etching apparatus and solid source etching method |
| abstract | PROBLEM TO BE SOLVED: To provide a solid source etching apparatus and a solid source etching method capable of performing dry etching with a simple apparatus configuration. An etching chamber is provided with an electrode having a function of generating a high-frequency plasma and a sample holder for holding a sample to be etched. A solid source 18 for etching gas is also arranged. Further, a discharge gas 20 is introduced into the etching chamber 10. When high frequency power is applied from the electrode 12 to the discharge gas 20 and plasma of the discharge gas 20 is generated, the solid source 18 is struck by this plasma, and the components of the solid source 18 are gasified to become a reactive etching gas. . The reactive etching gas is turned into plasma by applying high-frequency power from the electrode 12, and the sample 14 is dry-etched by the plasma. [Selection] Figure 1 |
| priorityDate | 2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.