http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020198295-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
filingDate | 2020-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97883ade54665dd2aa3b7162da9f2aaf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_712d424e333de618dbded84d58e415ad |
publicationDate | 2020-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2020198295-A |
titleOfInvention | Plasma processing equipment |
abstract | PROBLEM TO BE SOLVED: To provide a technique capable of improving the uniformity of electric field strength along the longitudinal direction of a processing container. A plasma processing apparatus according to one aspect of the present disclosure comprises a cylindrical processing container, a pair of plasma electrodes 33 arranged to face each other along the longitudinal direction of the processing container, and the pair of plasma electrodes 33. A high-frequency power source for supplying high-frequency power is provided, and the distance L41 between electrodes at a position away from the feeding position where the high-frequency power is supplied is longer than the distance L42 between the electrodes at the feeding position. [Selection diagram] Fig. 4 |
priorityDate | 2019-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.