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filingDate 2020-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97883ade54665dd2aa3b7162da9f2aaf
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publicationDate 2020-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2020198295-A
titleOfInvention Plasma processing equipment
abstract PROBLEM TO BE SOLVED: To provide a technique capable of improving the uniformity of electric field strength along the longitudinal direction of a processing container. A plasma processing apparatus according to one aspect of the present disclosure comprises a cylindrical processing container, a pair of plasma electrodes 33 arranged to face each other along the longitudinal direction of the processing container, and the pair of plasma electrodes 33. A high-frequency power source for supplying high-frequency power is provided, and the distance L41 between electrodes at a position away from the feeding position where the high-frequency power is supplied is longer than the distance L42 between the electrodes at the feeding position. [Selection diagram] Fig. 4
priorityDate 2019-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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