http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020092195-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_82cbc291d77c061ac9a216f86ec010a3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate | 2018-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e442309e1579b4a82d57067a6050e28 |
| publicationDate | 2020-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020092195-A |
| titleOfInvention | Plasma processing apparatus and plasma processing method |
| abstract | PROBLEM TO BE SOLVED: To provide a plasma processing apparatus using a VHF band high frequency and capable of suppressing a high frequency electric field between a central portion and an outer peripheral portion of a stage. A plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, an upper electrode, and an introduction unit. The stage is provided in the processing container. The upper electrode is provided above the stage via a space inside the processing container. The introduction part is a high-frequency introduction part that is a VHF wave, and is provided at the lateral end of the space inside the processing container. The stage includes a body and a conductive layer. The main body is formed of an insulator. The conductive layer is provided in the main body. The conductive layer has the shortest distance from the top surface of the stage among the one or more conductive layers provided in the stage. The conductive layer is formed in a ring shape. [Selection diagram] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023145546-A1 |
| priorityDate | 2018-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.