http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020035986-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2018-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_983e04fd21f7236969e90b4c0113ad50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9814e6d1f7530123463aa481baf639f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1f72282d5b635a8f582b3df0aae8b7a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18864663eb4f3fb9804c2971096e1dd2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41f6103972a0d4dfc8a00a1bdd165942 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_466f7dce6864d6255f385492727f5626 |
| publicationDate | 2020-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020035986-A |
| titleOfInvention | Substrate processing method and substrate processing apparatus |
| abstract | An object of the present invention is to provide a substrate processing method and a substrate processing apparatus capable of reducing the influence of the stress of a solidified body containing a sublimable substance and reducing collapse of a pattern on a substrate. A liquid film of a pre-drying treatment liquid is formed on an upper surface of a substrate by supplying a pre-drying treatment liquid to an upper surface of a substrate on which a pattern is formed. By evaporating the solvent from the liquid film 100 to form the solidified body 101 on the upper surface of the substrate, and by sublimating the solidified body 101, the liquid film 100 is eliminated from the upper surface of the substrate (the liquid film eliminating step before drying). ). In the pre-drying liquid film elimination step, a region where the dried region D, the solidified body remaining region S, and the liquid remaining region L are arranged in this order from the central portion of the upper surface of the substrate toward the peripheral portion of the upper surface of the substrate is present. Occurs (region coexistence state generating step). Then, the dry region D is enlarged so that the solidified body remaining region S moves toward the peripheral edge of the upper surface of the substrate while maintaining the region coexistence state (dry region enlargement step). [Selection diagram] FIG. |
| priorityDate | 2018-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.