| abstract |
A polishing liquid composition for a sapphire plate that can achieve both high-speed polishing and reduction in thickness unevenness, a method for producing a sapphire plate using the same, and a method for polishing a sapphire plate to be polished. Abrasive grain A, amphoteric surfactant B1 represented by alkyldimethylamine oxide, amphoteric surfactant B2 represented by alkylbetaine and alkylamidopropylbetaine, 2-alkyl-N-carboxymethyl-N-hydroxy A polishing liquid composition for a sapphire substrate, comprising at least one amphoteric surfactant B selected from amphoteric surfactant B3 represented by ethylimidazolinium betaine, and an aqueous medium. [Selection figure] None |