| abstract |
The present invention provides a substrate drying apparatus and a substrate processing system capable of shortening the removal time of a sublimable substance. A substrate drying apparatus according to an embodiment includes a solvent and a sublimable substance, heats a solution attached to the surface of the substrate, precipitates the sublimable substance on the surface of the substrate, and deposits the sublimated substance. A heating unit for heating and sublimating the active substance, and a gas supply unit for supplying a gas to the surface of the substrate. [Selection] Figure 4 |