http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020012959-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
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filingDate 2019-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2020012959-A1
titleOfInvention Board processing method and board processing equipment
abstract The step of removing the solidified film by vaporizing the solidified film by heating the solidified film covering the uneven pattern formed on the substrate, and the step of removing the solidified film heats the solidified film. A step of forming an irradiation point of a laser beam to be formed on the substrate or the solidified film to form an exposed portion exposed from the solidified film of the uneven pattern, and moving the position of the irradiation point on the substrate or the solidified film. A substrate processing method including a step of enlarging the exposed portion by means of.
priorityDate 2018-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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