| abstract |
The present invention provides a compound, a resin, and a resist composition containing the compound that can produce a resist pattern with a good focus margin (DOF). A compound represented by formula (I), a resin, and a resist composition. [R 0 is halogen, H or C 1-6 alkyl substituted / unsubstituted with halogen; R 1 is independently a group containing a cyclic ether structure or H; A 1 is a single bond, an ester bond, an ether bond or A group having 1 or 2 alkadiyl groups having a carbonate bond; Ad is an adamantanediyl group or an adamantanetriyl group; n is 1 or 2, provided that when n is 2, at least one of R 1 contains a cyclic ether structure Group] [Selection figure] None |