Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0472b5cfd8625e1700a82dd9a929bd3 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-12 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-0294 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-0221 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-118 |
filingDate |
2015-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84fd1b08783305ba4ccbfa9b7ec8221a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c4402ffa245241b0e394f7c0adcdf62 |
publicationDate |
2015-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2015182465-A |
titleOfInvention |
Mold, optical element and manufacturing method thereof |
abstract |
The present invention provides a mold manufacturing method capable of forming a fine concavo-convex structure with a wide range of pitches including an infrared region on a surface having a large area or a curved surface. A plasma dry etching process in which a base material made of a semiconductor or metal material that reacts with sulfur hexafluoride is placed in a reactive ion etching apparatus, and a mixed gas of sulfur hexafluoride and oxygen is introduced. In this case, an oxide is scattered on the surface of the base material, and etching is performed on the surface of the base material with sulfur hexafluoride using the oxide as an etching prevention mask, whereby a pitch is formed on the surface of the base material. A fine concavo-convex structure is formed which is larger than 0.35 micrometers and whose upper limit of the pitch is the infrared region. [Selection] Figure 2 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6993837-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019211920-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019072885-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019072886-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019073729-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017159573-A |
priorityDate |
2014-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |