http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012078831-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
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filingDate 2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72c5ec6aead41331c324767f2de93288
publicationDate 2012-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012078831-A
titleOfInvention A method for producing a non-planar single particle film, a method for producing a fine structure using the single particle film etching mask, and a fine structure obtained by the production method.
abstract PROBLEM TO BE SOLVED: To provide a single particle film etching mask on a curved surface in which each particle constituting the single particle film is two-dimensionally closely packed and arranged with high precision, a method for manufacturing the same, and the single particle film etching mask A method for producing a fine structure on a curved surface and a highly accurate fine structure on a curved surface obtained by the production method are provided. Particles formed two-dimensionally on a substrate having a part or all of a surface having a pitch or size of 0.1 μm to 10000 μm in a non-planar part such as a curved surface, a slope and a step. Close-packed single particle film, A single particle film, wherein a deviation D (%) in the arrangement of particles defined by the following formula (1) is 10% or less. D (%) = | B−A | × 100 / A (1) (In formula (1), A represents the average particle diameter of the particles, and B represents the average pitch between the particles in the single particle film.) [Selection] Figure 1
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priorityDate 2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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