http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015174270-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
filingDate 2014-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b5d1e97e33f0772bdd7306332ddc39f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d5de3705a11a1be8e7475426f927261
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publicationDate 2015-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2015174270-A
titleOfInvention Gas barrier film
abstract [Problem] To provide a film having high gas barrier properties and excellent gas barrier properties without being laminated. At least one surface of a polymer base material (1) is selected from a first layer (2a) mainly composed of zinc oxide and / or a compound containing zinc sulfide and silicon dioxide, and silicon carbide, silicon nitride and silicon oxynitride. A gas barrier layer disposed in this order from a polymer base material, and the first layer and the second layer are formed by a nanoindentation method. A gas barrier film having a measured film hardness of 0.5 to 5.0 GPa. [Selection] Figure 1
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