http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015056419-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_74973199515dbabd2310245aab03e282 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
| filingDate | 2013-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58c280f9de314553a34c2e65f1844d8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_146d67a1a66fc491fc436983d8caa722 |
| publicationDate | 2015-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015056419-A |
| titleOfInvention | Strip substrate processing apparatus and method |
| abstract | The present invention provides a strip substrate processing apparatus and method capable of ensuring the adhesion of a strip substrate to an electrostatic chuck. A strip substrate B is arranged on the upper surface of an electrostatic chuck 22 and a weight plate 50A having a weight 52 and a through hole 53 is disposed. The weight 52 is located at the center of the strip substrate B, and the strip substrate is formed through the through hole 53. A cover plate that is placed on the strip substrate B so that a part of B is visible, the strip substrate B is pressed against the electrostatic chuck 22, and the inside of the vacuum vessel is evacuated to cover the entire strip substrate B. 60 is disposed above the weight plate 50A, plasma is generated inside the vacuum vessel, the strip substrate B pressed by the weight plate 50A is attracted to the electrostatic chuck 22, and the strip substrate B is attached to the electrostatic chuck 22. The cover plate 60 and the weight plate 50A are taken out and the strip substrate B brought into close contact with the electrostatic chuck 22 is subjected to plasma treatment. [Selection] Figure 6 |
| priorityDate | 2013-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562 |
Total number of triples: 17.