http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014239220-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0318 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32486 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2014-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a02db22c3089c77bc2ed95a15d0bed8 |
| publicationDate | 2014-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014239220-A |
| titleOfInvention | Chamber wall of plasma processing apparatus including a flow protective liquid layer |
| abstract | A semiconductor plasma processing apparatus having a flow protective liquid layer for protecting a plasma exposed surface of a plasma processing apparatus. A vacuum chamber in which a semiconductor substrate is processed, a process gas source in fluid communication with the vacuum chamber to supply the process gas into the vacuum chamber, and a plasma by exciting the process gas in the vacuum chamber. And an RF energy source adapted to condition. A chamber wall 305 can also be included, the chamber wall including means for supplying a plasma compatible liquid to the plasma exposed surface 301 of the chamber wall, wherein the plasma compatible liquid flows across the plasma exposed surface, thereby causing the plasma exposure. A flow protective liquid layer 302 is formed on the surface. A liquid source 250 delivers a plasma compatible liquid to the chamber walls. [Selection] Figure 2A |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023058495-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020088280-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018190783-A |
| priorityDate | 2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 413.