http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014153623-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8779ec0fd7212ab2a747ac7cccd72838 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2013-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd3cdb42019cc7bf54e7f0f560150e86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_539dfeeb25e4d6c8fd8e52194e4a0bce |
| publicationDate | 2014-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014153623-A |
| titleOfInvention | Negative radiation sensitive resin composition |
| abstract | The present invention provides a radiation-sensitive resin composition having a high hardness / transparency and capable of obtaining a cured product having high adhesion to a substrate having an ITO film or wiring. Polysiloxanes containing at least one thiol group, polyfunctional ethylenically unsaturated compounds and vinylimidazole, 1-benzyl-2-methylimidazole and 2,3-dihydro-1H-benzo [d] pyrrolo [1] , 2-a] A negative radiation-sensitive resin composition containing a specific nitrogen-containing compound such as a compound selected from the group consisting of imidazoles. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019164016-A1 |
| priorityDate | 2013-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 187.