| abstract |
(57) Abstract: A positive pattern using an alkali-soluble novolac type resin capable of forming a resist pattern having excellent adhesion to a substrate in the production of semiconductor devices, LCDs, etc. without impairing the storage stability of the resist. Providing a photoresist composition. SOLUTION: For a basic composition consisting of an alkali-soluble novolac type resin and a quinonediazide group-containing compound, The following formula (I) (Wherein R 1 represents a vinyl group, a benzyl group, a C1 to C5 alkyl group, a hydrogen atom, and R 2 represents a C1 to C5 alkyl group, a hydrogen atom). Positive photoresist composition. |