| abstract |
An exposure margin (EL) and line width roughness (LWR) are excellent, and a space pattern on a stepped substrate is excellent, and particularly suitable for a negative pattern forming method by organic solvent development. In particular, an actinic ray-sensitive or radiation-sensitive resin composition suitable for KrF exposure, a pattern forming method using the same, a resist film, an electronic device manufacturing method, and an electronic device are provided. SOLUTION: It has an aromatic group and (i) a repeating unit having a group that decomposes by the action of an acid to generate a polar group, and (ii) has a repeating unit having a polar group other than a phenolic hydroxyl group. An actinic ray-sensitive or radiation-sensitive resin composition containing the resin (A), which is a total of the repeating units (i) and (ii) with respect to all repeating units in the resin (A). Is an actinic ray-sensitive or radiation-sensitive resin composition having 51 mol% or more. [Selection figure] None |