| abstract |
The present invention provides a material for forming a self-organized pattern capable of producing a fine pattern of nm order having high etching resistance. SOLUTION: An organic group selected from the group consisting of a sugar skeleton, a steroid skeleton, an oligoamino acid skeleton, an oligolactic acid skeleton, a porphyrin skeleton, and a multiple compound skeleton has a substituted or unsubstituted aliphatic hydrocarbon group and an alicyclic ring. Type hydrocarbon group, aromatic hydrocarbon group, heterocyclic group, and aliphatic hydrocarbon group, alicyclic hydrocarbon group, aromatic hydrocarbon group, siloxanyl group, disiloxanyl group, trisiloxanyl substituted by heterocyclic group A compound in which a silsesquioxane skeleton having a group selected from the group consisting of a group, a polysiloxanyl group and a hydrogen group is bonded through a specific divalent bond. [Selection figure] None |