| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D285-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D321-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 |
| filingDate |
2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a9aacf507db12b95a8f92ddad3e63f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cc1db49bfd3b30adf323473ea1a4126 |
| publicationDate |
2013-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013235253-A |
| titleOfInvention |
Resist composition and method for producing resist pattern |
| abstract |
An object of the present invention is to provide a resist composition capable of producing a resist pattern having a good focus margin at the time of producing the resist pattern and generating less defects. A resist composition comprising a resin having a structural unit represented by formula (I), a resin having an acid labile group, and an acid generator represented by formula (II). Wherein R 1 is a hydrogen atom or a methyl group; A 1 is — (CH 2 ) m1 — or the like; R 2 is a hydrocarbon group having a fluorine atom; Q 1 and Q 2 are each a fluorine atom or a perfluoroalkyl Group; L 1 is a divalent saturated hydrocarbon group; ring W is an alicyclic hydrocarbon ring; R f1 and R f2 are each a fluorine atom or a fluorinated alkyl group; s is an integer of 1 to 10; Z + is Represents an organic cation. ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10261417-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10359700-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015159830-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160135124-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150133647-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015159830-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101882716-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016000725-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102372574-B1 |
| priorityDate |
2012-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |