Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film using same, pattern formation method, production method for electronic device, and electronic device
1. A photoactive photo-sensitive or radiation-sensitive resin composition comprising a resin (A) and a photoacid generator (B) which generates an acid upon irradiation with an actinic ray or radiation, wherein the photoacid generator (B) Sensitive resin composition containing at least a photoacid generator (B1) represented by the formula (1) and a photoacid generator (B2) different from the photoacid generator (B1).