| abstract |
A resist composition capable of producing a resist pattern with a wide exposure margin and a novel compound (salt) useful as a component of the resist composition are provided. A resist composition comprising a salt represented by formula (I), the salt, a resin whose solubility in an alkaline aqueous solution is increased by the action of an acid, an acid generator (B), and a solvent. Offer. [Wherein, X 1 represents an aliphatic saturated hydrocarbon group, and X 2 represents a fluorinated alkyl group. W 1 represents an alicyclic hydrocarbon group or the like. ] [Selection figure] None |