| abstract |
Disclosed is a radiation-sensitive resin composition that is a chemically amplified resist that is excellent in depth of focus, LWR, and MEEF, and also excellent in development defects. A radiation-sensitive resin composition comprising (A) a polymer containing two specific repeating units, (B) a radiation-sensitive acid generator and (C) a compound having a specific ammonium structure. I will provide a. [Selection figure] None |