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filingDate 2011-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0014a1119c9a39af1795c49594cafe4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27c26f745089460e45b9056460b32379
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publicationDate 2013-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013115185-A
titleOfInvention Manufacturing method of semiconductor device
abstract PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method capable of suppressing a void at the time of mounting a semiconductor element and manufacturing a highly reliable semiconductor device. The present invention relates to a semiconductor including an adherend, a semiconductor element electrically connected to the adherend, and an underfill material that fills a space between the adherend and the semiconductor element. A method for manufacturing an apparatus, the step of preparing a sealing sheet comprising a base material and an underfill material laminated on the base material, and the sealing sheet on the surface on which the connecting member of the semiconductor wafer is formed A step of bonding, a step of dicing the semiconductor wafer to form the semiconductor element with the underfill material, a step of holding the semiconductor element with the underfill material at 100 to 200 ° C. for 1 second or more, And a step of electrically connecting the semiconductor element and the adherend via the connecting member while filling a space between the adherend and the semiconductor element with an underfill material. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019197840-A
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priorityDate 2011-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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