| abstract |
The present invention provides a photoresist composition comprising a tailor-made photoacid generator having better diffusion control and attendant properties such as resist profile. A formula (I): [A- (CHR 1) p] k - (L) - (CH 2) m - (C (R 2) 2) n -SO 3 - Z + (I) ( wherein Wherein A is a substituted or unsubstituted monocyclic, polycyclic or fused polycyclic cycloaliphatic group, R 1 is H, a single bond or a substituted or unsubstituted C 1-30 alkyl group, R 2 is H, F, or C 1-4 fluoroalkyl, L is a sulfonate group, sulfonamide group, or a linking group containing a C 1-30 sulfonate or sulfonamide-containing group , Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or more, and n is an integer of 1 or more) Acid generator compound. [Selection figure] None |