| abstract |
Disclosed is a radiation-sensitive composition which enables formation of a chemically amplified positive resist film which is effectively sensitive to active light or radiation and capable of stably forming a fine pattern with high precision, while having excellent nano edge roughness and high sensitivity. Specifically disclosed is a composition containing an acid-cleavable group-containing polymer (A) which is alkali-insoluble or poorly alkali-soluble but becomes easily alkali-soluble by the action of an acid, and an acid generator (B). The composition contains, as the polymer (A), a polymer containing a repeating unit represented by Formula (1) and having a weight average molecular weight as determined by GPC of 3,000-100,000. (1) [In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a substituted or unsubstituted, linear or branched monovalent alkyl group having 1-20 carbon atoms, an alicyclic group having 3-25 carbon atoms or an aryl group having 6-22 carbon atoms; and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted, linear, branched or alicyclic hydrocarbon group having 2-25 carbon atoms.] |