http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012507144-A

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76825
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2009-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012507144-A
titleOfInvention Silicon etching method and apparatus with passivation using plasma enhanced oxidation
abstract A method and apparatus are provided for etching a silicon layer through a patterned mask formed thereon. The silicon layer is placed in the etching chamber. An etching gas including a fluorine-containing gas and an oxygen / hydrogen-containing gas is provided into the etching chamber. A plasma is generated from the etching gas and features are etched into the silicon layer using the plasma. The etching gas is then stopped. The plasma may contain OH radicals. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018182142-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018193971-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016189409-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012507145-A
priorityDate 2008-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007103876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11111686-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007533139-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08115899-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526621
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID702
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538410
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977

Total number of triples: 34.