| abstract |
The present invention provides a pattern forming method capable of forming a pattern in a small number of steps and at low cost by utilizing microphase separation of a block copolymer. According to an embodiment, a polymer film is formed on a substrate, and the polymer film is selectively irradiated with energy rays under first and second conditions, thereby the polymer film. First and second regions having different surface free energies are formed on the surface, a block copolymer layer including first and second block chains is formed on the polymer film, and the block copolymer is microphase-separated. A pattern forming method is provided. [Selection] Figure 1 |