| abstract |
Which is capable of forming a phase separation structure by self-organization and forming a base capable of forming a residue and a pattern with few defects. The present invention relates to a resin composition comprising a first repeating unit containing a crosslinkable group, a second repeating unit different from the first repeating unit, and a third repeating unit different from the first repeating unit and having a higher polarity than the second repeating unit A polymer having a structural unit containing a first group which interacts with Si-OH, Si-H or Si-N on at least one end of the main chain, and a solvent. A block copolymer comprising a block including the second repeating unit and a block including the third repeating unit, the block copolymer being formed on an upper surface side of a substrate having a surface layer of Si-OH, Si-H, or Si- It is preferable to be used for forming the base of the self-assembled film. |