| abstract |
A (meth) acrylate monomer comprising an acetal moiety, a polymer comprising units formed from the monomer, and a photoresist composition comprising the polymer. A (meth) acrylic acid ester monomer obtained from an alcohol having two acetal ring structures. The monomers, polymers, and photoresist compositions are useful for photolithography pattern formation. Also provided are a substrate coated with the photoresist composition, a method of forming a photolithography pattern, and an electronic device. This composition, method and coated substrate have found particular applicability in the manufacture of semiconductor devices. [Selection figure] None |