| abstract |
(57) [Problem] To provide a photoresist cross-linking agent exhibiting excellent cross-linking ability even at a lower exposure energy than before. A photoresist cross-linking agent comprising a compound represented by the following formula (1). Embedded image In the above formula, R 1 , R 2 and R each have 1 to 10 carbon atoms. Main chain or side chain substituted alkyl, ester, ketone, carboxylic acid, acetal, one or more hydroxyl group (-O H) is selected from the group consisting of alkyls, esters, ketones, carboxylic acids and acetals having 1 to 10 carbon atoms and substituted with a side chain or a main chain, wherein R 3 is hydrogen or methyl; 0 or 1, and n is an integer selected from 1 to 5. |