| abstract |
Improved polymers, photoresist compositions, and negative tone development that enable the formation of fine patterns in electronic device manufacturing and avoid or significantly improve one or more of the above-mentioned problems associated with the state of the art Of photolithographic methods for A polymer comprising a unit containing a specific acetal moiety and a unit containing a lactone moiety. A photoresist composition comprising the polymer, a substrate coated with the photoresist composition, and a method of forming a photolithography pattern. This polymer, composition, method and coated substrate find particular applicability in the manufacture of semiconductor devices. [Selection] Figure 2 |