| titleOfInvention |
Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, antireflection film, optical device, and solid-state imaging device |
| abstract |
The present invention relates to a photosensitive composition, a pattern forming material capable of forming a pattern having a low refractive index, excellent film strength and few development defects at high resolution, and a photosensitive film using the same. , A pattern formation method, a pattern film, a low refractive index film, an antireflection film, an optical device, and a solid-state imaging device. SOLUTION: (A) hollow or porous particles, (B) an alkali-soluble particle dispersant having a group capable of chemically bonding to the particles (A), (C) active species by irradiation with actinic rays or radiation. A photosensitive composition comprising a compound to be generated and (D) a binder whose solubility in an alkaline developer is reduced by the action of the active species. [Selection figure] None |