Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F246-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-00 |
filingDate |
2016-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2018-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-WO2017104355-A1 |
titleOfInvention |
Resist composition, resist film, mask blank, pattern forming method, and electronic device manufacturing method |
abstract |
According to the present invention, a resist composition containing a resin (P) having a repeating unit (a) having an internal salt structure, a resist film formed from the resist composition, a mask blank, and the resist composition are used. A pattern forming method and a method for manufacturing an electronic device including the pattern forming method are provided. |
priorityDate |
2015-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |