| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2011-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011511855-A |
| titleOfInvention |
Fluorine-free heteroaromatic photoacid generator and photoresist composition containing the same |
| abstract |
A fluorine-free heteroaromatic photoacid generator and a photoresist composition containing the same are provided. A photoresist composition containing a fluorine-free photoacid generator and a fluorine-free photoacid activator can be used as an alternative to a PFOS / PFAS photoacid generator-containing photoresist. Photoacid generators are characterized by the presence of a fluorine-free heteroaromatic sulfonic acid anion component. The photoacid generator preferably contains an onium cation component, and more preferably contains a sulfonium cation component. The photoresist composition preferably contains an acid sensitive imaging polymer. This composition is particularly useful for forming material patterns using 193 nm (ArF) imaging radiation. [Selection] No figure |
| priorityDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |