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publicationDate 2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011508431-A
titleOfInvention Silicon deep etching with silicon structure fabrication and profile control
abstract 【Task】 A method for etching features in a silicon layer using a steady state gas flow is provided. An etching gas containing an oxygen-containing gas and a fluorine-containing gas is used to generate plasma from the etching gas, and then the etching gas flow is shut off. [Selection] Figure 1
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