| abstract |
A novel composition that can be used as a base antireflective coating layer in the manufacture of microelectronic wafers. New compositions that can be used as the base antireflective coating and that can be removed with an aqueous photoresist developer are particularly desirable. In one aspect, an organic coating composition, particularly an antireflective coating composition, comprising a diene / dienophile reaction product is provided. In another form, an organic coating composition, particularly an antireflective coating composition, is provided that includes a component that includes a hydroxyl naphtho group, such as a 6-hydroxy-2-naphtho group. Preferred compositions of the present invention are useful for reducing the reflection of exposure radiation returning from the substrate to the overcoated photoresist layer and / or functioning as a planarizing, conformal or via fill layer. [Selection figure] None |