Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16 |
filingDate |
2022-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee3e8b084f7299eaac66117d7aa82dce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67787db023e7ebef6a9f218cc2e76d4d |
publicationDate |
2022-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2022163602-A1 |
titleOfInvention |
Resist underlayer film-forming composition containing polymer having alicyclic hydrocarbon group |
abstract |
The present invention provides: a composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. This composition for forming a resist underlayer film contains a polymer and a solvent, said polymer comprising a unit structure (A) represented by formula (1) [in formula (1): R 1 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms; and L 1 represents an optionally substituted aliphatic ring, an aryl group having 6-40 carbon atoms or a hetero ring] and a unit structure (B) that contains an aliphatic ring in a side chain and that is different from the unit structure (A). |
priorityDate |
2021-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |