| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1998-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a07fd7acd475118bc602e08b57373702 |
| publicationDate |
2000-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000098595-A |
| titleOfInvention |
Anti-reflective coating material composition for photoresist |
| abstract |
(57) Abstract: An antireflection film having a high absorbance for light having a wavelength used for exposure is formed, and the adverse effect of a standing wave generated by reflection from a substrate can be reduced. An object of the present invention is to provide an anti-reflective coating material composition for a photoresist which can improve a critical resolution of a photoresist and obtain a good resist profile, and a method of forming a resist pattern using the same. A light having a molar extinction coefficient of 1.0 × 10 4 or more is activated by a polymer having a dye structure having a molar extinction coefficient of at least 1.0 × 10 4 with respect to light having a wavelength for exposing the photoresist, and A thermal crosslinking agent capable of forming a crosslinked structure by reacting with An antireflective coating material composition for photoresists, which has a temperature of 150 to 200 [deg.] C. when decomposed to generate an acid, and contains a compound which generates an acid by heat and an organic solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE41128-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053652-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006504807-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9607849-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964332-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101561051-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013054702-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006502448-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002530697-A |
| priorityDate |
1998-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |