http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010282228-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2010-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0735952117143eac179e69a1ee7b6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 |
| publicationDate | 2010-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010282228-A |
| titleOfInvention | Radiation sensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a chemically amplified resist sensitive to actinic radiation, for example, ultraviolet rays such as g-line and i-line, KrF excimer laser, ArF excimer laser, F2 excimer laser, far ultraviolet rays represented by EUV, or electron beam. To provide a radiation-sensitive composition having excellent storage stability in addition to resolution and environmental resistance. A compound having a structure in which at least one hydrogen atom is bonded to a nitrogen atom and a compound in which one or more hydrogen atoms bonded to the nitrogen atom are protected by a specific group is contained. A radiation-sensitive resin composition is provided. [Selection figure] None |
| priorityDate | 2010-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 714.